X-ray Diffraction and Atomic Force Microscopy of RuO2 thin films

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2021-01-01
2021-06-30

Date completed

2022-08-15

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X-ray Diffraction and Atomic Force Microscopy of RuO2 thin films

Published Date

2022-08-18

Author Contact

Jalan, Bharat
bjalan@umn.edu

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Experimental Data

Abstract

X-ray Diffraction data of the RuO2 samples were obtained to assess the crystallinity and epitaxial nature of the thin films grown on different substrates. Atomic Force Microscopy was used to determine the surface morphology changes as a function of thickness and epitaxial strain and correlate it with the observed oxygen evolution activity.

Description

X-ray Diffraction 2theta-omega couples scans for RuO2 on r-Al2O3 (Supplementary Figure 1 a) of different thicknesses. Similar data is used for comparing RuO2 films with comparable thickness grown on r-Al2O3 and TiO2 (101) substrate (Supplemetary Fig 6b). Atomic Force Microscopy images acquired using a Bruker multimode for comparing surface morphology change as a function of thickness of RuO2 film grown on r-Al2O3 substrate (Supplementary Fig 1 b)

Referenced by

https://doi.org/10.1016/j.mtener.2022.101087

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University of Minnesota MRSEC under Award Number DMR-2011401

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Nunn, William; Manjeshwar, Anusha K; Nair, Sreejith; Jalan, Bharat. (2022). X-ray Diffraction and Atomic Force Microscopy of RuO2 thin films. Retrieved from the Data Repository for the University of Minnesota (DRUM), https://doi.org/10.13020/qda2-zf10.

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