Mathematical modeling in industry - IMA Summer program for graduate students, July 19--28, 2000

2001-02
No Thumbnail Available

Persistent link to this item

Statistics
View Statistics

Journal Title

Journal ISSN

Volume Title

Title

Mathematical modeling in industry - IMA Summer program for graduate students, July 19--28, 2000

Authors

Published Date

2001-02

Publisher

Type

Abstract

Keywords

Description

See individual papers: 1752-1, Numerical Steady-State Solutions of Non-Linear DAE's Arising in RF Communication Circuit Design by Danny Dunlavy, Sookhyung Joo, Runchang Lin, Roummel Marcia, Aurelia Minut, and Jianzhong Sun (Robert Melville, mentor); 1752-2, Optimizing Language Models for Speech Recognition by Lynch Hruska, Maria Kiskowski, Jennifer Lefeaux, Kevin McCleary, Dany Ngouyassa, Bryan Smith (Joan Bachenko, mentor); 1752-3, The Bivariate Contouring Problem by Thomas Grandine, Bogdan Craciun, Noel Heitmann, Brian Ingalls, Quoc Thong Le Gia, Miao-jung Ou, and Yen-hsi Richard Tsai (Thomas Grandine, mentor); 1752-4, Second Order Solution of Fritz John's Ultrahyperbolic PDE for Volumetric Computed Tomography by Jicun Hu, Chris Ingrassia, Svenja Lowitzsch, Jang Park, Angel Pineda, Daniel Reynolds, and Nicholas Valdivia (S.K. Patch, mentor); 1752-5, A network diversion vulnerability problem by Ariel Cintron-Arias, Norman Curet, Lisa Denogean, Robert Ellis, Corey Gonzalez, Shobha Oruganti, and Patrick Quillen (Norm Curet, mentor); 1752-6, The Design of a Microactuator by Y. Chung, Z. Lavicza, H. Lim, D. Malonza, M. Song, and N. Tarfulea (David Ross, mentor)

Replaces

License

Series/Report Number

Funding information

Isbn identifier

Doi identifier

Previously Published Citation

Suggested citation

. (2001). Mathematical modeling in industry - IMA Summer program for graduate students, July 19--28, 2000. Retrieved from the University Digital Conservancy, https://hdl.handle.net/11299/3548.

Content distributed via the University Digital Conservancy may be subject to additional license and use restrictions applied by the depositor. By using these files, users agree to the Terms of Use. Materials in the UDC may contain content that is disturbing and/or harmful. For more information, please see our statement on harmful content in digital repositories.