Electron spin-flip scattering in graphene due to substrate impurities

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Electron spin-flip scattering in graphene due to substrate impurities

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Goswami, Aditi

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2013-01

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Abstract

Graphene has long been known for its peculiar Dirac-like band structure which lends it many of its remarkable properties. It is a promising material for electronic and spintronic applications due to its high carrier mobility, low intrinsic spin-orbit interaction and small hyperfine coupling. However, extrinsic effects may easily dominate intrinsic mechanisms. The scattering mechanisms investigated here are those associated with non-magnetic, charged impurities in the substrate (e.g. SiO2) beneath a planar n-type graphene layer. Such impurities cause an electric field that extends through the graphene and has a non-vanishing perpendicular component. Consequently, the impurity, in addition to the conventional spin-conserving scattering can give rise to spin-flip processes. The latter are a consequence of a spatially varying Rashba spin-orbit interaction caused by the electric field of the impurity in the substrate. This work focuses on the calculation of the elastic scattering cross-sections for these mechanisms. Additionally, relaxation times are estimated for assumed impurity concentrations.

Keywords

Graphene

Scattering

Spintronics

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University of Minnesota M.S. January 2013. Major: Electrical Engineering. Advisor: P. Paul Ruden. 1 computer file (PDF); vi, 34 pages.

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Goswami, Aditi. (2013). Electron spin-flip scattering in graphene due to substrate impurities. Retrieved from the University Digital Conservancy, https://hdl.handle.net/11299/146387.

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