Transparent flexible electronics by directed integration of inorganic micro and nanomaterials.

Abstract

nanomaterials. Our approaches involved local adjustment of electrostatics at the surfaces to control material flux. Templating of surface electrostatics was implemented differently for three broad concepts resulting in control over nanomaterial synthesis, deposition, and printing. These three general concepts are: (A) Tailored ZnO nanowire synthesis and integration out of the liquid phase (B) Arc discharge synthesis and continuous nanocluster deposition from the gas phase (C) Contact electrification and xerographic printing of nanoparticles from the gas phase Concept (A): We report a method to fabricate and transfer crystalline ZnO with control over location, orientation, size, and shape. The process uses an oxygen plasma treatment in combination with a photoresist pattern on Magnesium-doped GaN substrates to define narrow nucleation regions and attachment points with 100 nanometer scale dimensions. Lateral epitaxial overgrowth follows nucleation to produce single crystalline ZnO which were fabricated into LEDs and photovoltaic cells. Concept (B): We report a gas phase nanoparticle deposition system which shares characteristics with liquid phase electrodeposition. Clusters of charged nanoparticles selectively deposit onto electrically grounded surfaces. Similar to electroplating, the continued deposition of Au nanoparticles onto underlying resistive traces increased overall line conductivity. Alternatively, semiconducting ZnO and Ge nanomaterial sequentially deposited between interdigitated electrodes and served as addressable sensor active areas. Concept (C): We report patterned transfer of charge between conformal material interfaces through a concept referred to as nanocontact electrification. Nanocontacts of different size and shape are formed between surface functionalized polydimethylsiloxane (PDMS) stamps and other dielectric materials (PMMA, SiO2). Forced delamination and cleavage of the interface yields a well defined charge pattern with a minimal feature size of 100 nm. The process produces charged surfaces and associated fields that exceed the breakdown strength of air leading to strong long range adhesive forces and force distance curves which are recorded over macroscopic distances. The process is applied to fabricate charge patterned surfaces for nanoxerography demonstrating 200 nm resolution nanoparticle prints and applied to thin film electronics where the patterned charges are used to shift the threshold voltages of underlying transistors by over 500 mV.