Grasse, Cole M.2009-05-152009-05-152009-04-08https://hdl.handle.net/11299/50094Additional contributors: Christopher McNeil; David Blank (faculty mentor).The antimicrobial agent known as Triclosan is prevalent in almost every household in America. It is a commonly found ingredient in various pharmaceutical and personal care products. Triclosan's virtue comes from its antibacterial properties, which have garnered it much commercial applicability. However, Triclosan undergoes photolysis when it is exposed to sunlight causing it to produce the compounds 2,8-DCDD and 2,4-DCP, which further photodegrade into toxic chlorine products. It is important to understand the pathways by which Triclosan photodegrades in order to develop safer antibacterials in the future. Understanding the photophysics and chemistry of these pathways is the primary objective of this experimentation. On the global scale, analyzing the photophysical properties of Triclosan will be essential in the development and production of more environmentally neutral antibacterial agents. The value of this research also resides in the physical and chemical knowledge gained from the examination of Triclosan's photolytic mechanisms.en-USInstitute of TechnologySchool of Physics and AstronomyDepartment of ChemistryPresentation