High-k Gate dielectric materials for CMOS.

McCarthy, Ivana2011-04-062011-04-062010-08https://hdl.handle.net/11299/102363University of Minnesota M.S. thesis. August 2010. Major:Electrical Engineering. Advisor: Stephen A. Campbell. 1 computer file (PDF); v, 32 pages. Ill. (some col.)Abstract summary not availableen-USMOSFETsSwitching speedPhysical gate oxideOxideMoore’s LawElectrical engineeringHigh-k Gate dielectric materials for CMOS.Thesis or Dissertation