Structural and chemical characterization data for Ir and Ru metal/metal-oxide thin films showing strain dependence of metal oxidation

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2021-05-15
2022-06-30

Date Completed

2023-03-13

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Nair, Sreejith T
nair0074@umn.edu

Abstract

In this work, the authors uncover a previously unexplored effect of substrate imposed epitaxial strain on the formation energy of a crystalline epitaxial metal oxide thin film, thereby revealing an additional tuning knob to engineer synthesis of oxide thin films of hard-to-oxidize metals.

Description

The files contain the source data for characterizations performed on the Ir/IrO2 and Ru/RuO2 thin films grown in this work. The characterization techniques for which raw files have been provided include X-ray Diffraction (XRD), X-ray Photoelectron Spectroscopy (XPS), Atomic Force Microscopy (AFM), Energy Dispersive X-ray Spectroscopy line scans and electrical transport measurements. Any additional information can be requested from the corresponding author.

Referenced by

Nair, S.; Yang, Z.; Lee, D.; Guo, S.; Sadowski, J.T.; Johnson, S.; Saboor, A.; Li, Y.; Zhou, H.; Comes, R.B.; Jin, W.; Mkhoyan, K.A.; Janotti, A.; Jalan, B. Engineering metal oxidation using epitaxial strain. Nat. Nanotechnol., 2023, 18, 1005-1011.
https://doi.org/10.1038/s41565-023-01397-0

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Attribution-NonCommercial-NoDerivs 3.0 United States
http://creativecommons.org/licenses/by-nc-nd/3.0/us/

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Funding Information

Film growth and characterization (S.N., D.L. and B.J.) was supported by the U.S. Department of Energy through DE-SC0020211. S.N. and D.L acknowledge support from the Air Force Office of Scientific Research (AFOSR) through Grant No. FA9550-21-1-0025 and FA9550-21-0460. S.G., Z.Y. and K.A.M. were supported partially by the UMN MRSEC program under Award No. DMR-2011401. S.G. and K.A.M. were also supported by SMART, one of seven centers of nCORE, a Semiconductor Research Corporation program, sponsored by the National Institute of Standards and Technology (NIST). Parts of this work were carried out at the Characterization Facility, University of Minnesota, which receives partial support from the NSF through the MRSEC program under Award No. DMR-2011401. S.J. acknowledges support from the NSF under Award No. DMR-2129879. W.J. acknowledge support from the DOE Office of Science under DE-SC0023478. R.B.C. acknowledges support from the AFOSR Young Investigator Program under FA9550-20-1-0034. A.J. and A.S. acknowledge support from the NSF through the UD-CHARM University of Delaware Materials Research Science and Engineering Center (No. DMR-2011824). The first-principles calculations used Bridges-2 at PSC through allocation DMR150099 from the Advanced Cyberinfrastructure Coordination Ecosystem: Services & Support (ACCESS) program, which is supported by National Science Foundation grants #2138259, #2138286, #2138307, #2137603, and #2138296, and the DARWIN computing system at the University of Delaware, which is supported by the NSF grant no. 1919839. This research used resources of the Center for Functional Nanomaterials and National Synchrotron Light Source II, which are U.S. DOE Office of Science Facilities, at Brookhaven National Laboratory under Contract No. DE-SC0012704. This research used resources of the Advanced Photon Source, a U.S. Department of Energy (DOE) Office of Science user facility operated for the DOE Office of Science by Argonne National Laboratory under Contract No. DE-AC02-06CH11357

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Nair, Sreejith T; Yang, Zhifei; Lee, Dooyong; Guo, Silu; Sadowski, Jerzy T; Johnson, Spencer; Saboor, Abdul; Li, Yan; Zhou, Hua; Comes, Ryan B; Jin, Wencan; Mkhoyan, Andre K; Janotti, Anderson; Jalan, Bharat. (2023). Structural and chemical characterization data for Ir and Ru metal/metal-oxide thin films showing strain dependence of metal oxidation. Retrieved from the Data Repository for the University of Minnesota (DRUM), https://doi.org/10.13020/9wm7-x981.

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